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APPARATUS FOR FORMING LOW-TEMPERATURE OXIDE FILMS AND METHOD OF FORMING LOW-TEMPERATURE OXIDE FILMS
APPARATUS FOR FORMING LOW-TEMPERATURE OXIDE FILMS AND METHOD OF FORMING LOW-TEMPERATURE OXIDE FILMS
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机译:形成低温氧化物膜的装置和形成低温氧化物膜的方法
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摘要
The present invention aims at providing an apparatus for and a method of forming low-temperature oxide films, which are capable of forming an oxide film at a low temperature and preventing the diffusion of impurities from the outside. The apparatus for forming an oxide film at a low temperature is characterized in that it has an oxidation furnace provided with a gas supply port and a gas discharge port, a heater for heating the oxidation furnace to a predetermined temperature, and a gas supply system disposed upstream of the oxidation furnace and provided with a means for adding an arbitrary quantity of water or a means for generating an arbitrary quantity of water.
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