Fine processing device using low energy neutral particle beam

摘要

A fine processing apparatus using a low energy neutral particle beam is disclosed. The apparatus includes a plasma chamber for generating a high-density plasma, an electrode for extracting a low-energy ion beam from the plasma chamber, an active gas introduced into the plasma chamber to contact the ion beam to neutralize the ion beam through charge exchange, And a means for aligning the direction of motion of the neutral particle beam generated in the neutralization chamber toward the object to be treated. This fine processing is performed with the help of the irradiation of the active gas absorbed on the surface of the object to be treated and the irradiation with the low energy neutral particle beam.