首页> 外国专利> PROCESS OF MANUFACTURE OF ACTIVE LASER MEDIUM ON BASE OF MONOCRYSTAL OF LITHIUM FLUORIDE WITH F2 CENTERS

PROCESS OF MANUFACTURE OF ACTIVE LASER MEDIUM ON BASE OF MONOCRYSTAL OF LITHIUM FLUORIDE WITH F2 CENTERS

机译:以F 2 为中心的氟化锂单晶制备活性激光介质的过程

摘要

FIELD: quantum electronics. SUBSTANCE: crystal of lithium fluoride is irradiated with heavy-current electron pulses with 10 ns duration. Energy of electrons is established at 200 keV and current in beam is set at F2. Irradiation is performed at room temperature. For the course of 50 s crystal is irradiated with 300 pulses. Used irradiation value is equal to 0.8, where , is time of life of anionic vacancies. Experiments display necessity of selection of irradiation time from 0.1 up to 65 to increase stability of concentration of t centers. EFFECT: increased stability of concentration of F2 centers.
机译:领域:量子电子学。物质:持续10 ns的大电流电子脉冲照射氟化锂晶体。电子的能量确定为200 keV,电子束中的电流设置为F 2 。照射在室温下进行。在50 s的过程中,用300个脉冲照射晶体。使用的辐照值等于0.8 <图像文件=“ 00000002.GIF” he =“ 6” id =“ imag0.2” imgContent =“ undefined” imgFormat =“ GIF” wi =“ 12” />,其中,是时间的空缺寿命。实验表明有必要从0.1到65之间选择照射时间,以增加t中心浓度的稳定性。效果:提高了F 2 中心浓度的稳定性。

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