Resist composition comprising a quinone diazide sulfonic diester and a quinone diazide sulfonic complete ester

摘要

A positive resist composition which comprises in admixture an alkali- soluble resin and, as a sensitizer, first and second quinone diazide sulfonic acid esters of a phenol compound, whereinP P(a) the first ester is a quinone diazide sulfonic acid diester of a phenol compound having not less than three hydroxyl groups which exhibits a pattern area that is not less than 40% of all pattern areas corresponding to the sensitizer in a high pressure liquid chromatography (HPLC) pattern measured with a primary detector using UV light having a wavelength of 254 nm, andPP(b) the second ester is a quinone diazide sulfonic acid ester that is a complete ester of a phenol compound having not less than two hydroxyl groups which exhibits a pattern area corresponding to not less than 5% and is less than 60% of all pattern areas corresponding to the sensitizer in the HPLC pattern.