首页> 外国专利> Process for producing a perovskite film by irradiating a target of the perovskite with a laser beam and simultaneously irradiating the substrate upon which the perovskite is deposited with a laser beam

Process for producing a perovskite film by irradiating a target of the perovskite with a laser beam and simultaneously irradiating the substrate upon which the perovskite is deposited with a laser beam

机译:通过用激光束照射钙钛矿的靶并且同时用激光束照射钙钛矿的基板来生产钙钛矿膜的方法

摘要

There is provided a process for producing a dielectric thin film of a perovskite oxide on a substrate by a vapor-deposition process which includes vaporizing the oxide and irradiating the oxide vapor or the substrate with a laser beam.PPThere is also provided a pyroelectric type of sensor comprising: a MOS element including a drain electrode, a source electrode, a gate electrode and an Si semiconductor and a film of a ferroelectric or pyroelectric material formed on the drain electrode, the drain electrode being made of a material which exhibits a good ohmic contact with Si or SiO.sub.2 and has a lattice constant close to that of ferroelectric or pyroelectric material.
机译:提供了一种通过气相沉积法在基板上制备钙钛矿氧化物的介电薄膜的方法,该方法包括蒸发氧化物并用激光束照射氧化物蒸气或基板。还提供了一种热电型传感器,其包括:MOS元件,其包括漏极,源极,栅极和Si半导体,以及形成在漏极上的铁电或热电材料的膜,该漏极由金属制成。这种材料与Si或SiO2具有良好的欧姆接触,并且其晶格常数接近铁电或热电材料的晶格常数。

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