首页> 外国专利> FORMATION OF THIN FILM USING LASER ABRATION AND LASER ABRATION DEVICE

FORMATION OF THIN FILM USING LASER ABRATION AND LASER ABRATION DEVICE

机译:利用激光烧蚀和激光烧蚀装置形成薄膜

摘要

PURPOSE: To provide a thin film forming method using a laser abration, by which the thin film having uniform thickness and composition in the wide area can be formed. ;CONSTITUTION: The laser beam emitted from a laser beam oscillator 1 is reflected by galvano mirrors 3, 5 and further, introduced to a condensor lens 7 arranged on moving mechanism movable in two directions mutually crossing at right angle in the plane. Further, the laser beam irradiates a round disk target 12 arranged parallel with the moving range in the moving mechanism 9, 10 in a vacuum vessel 11. By this method, the thin film having uniform film thickness and small difference of the composition can be formed in large area on a substrate.;COPYRIGHT: (C)1996,JPO
机译:目的:提供一种利用激光磨蚀的薄膜形成方法,通过该方法可以形成在宽广的区域内具有均匀厚度和成分的薄膜。组成:从激光振荡器1发出的激光束被电镜3、5反射,然后被引入到聚光镜7,该聚光镜布置在可在两个相互垂直的方向上移动的移动机构上,该两个方向在平面上相互交叉。此外,激光束在真空容器11中照射与移动机构9、10中的移动范围平行的圆盘状靶材12。通过该方法,可以形成膜厚均匀且组成差异小的薄膜。在大面积的基材上。;版权所有:(C)1996,日本特许厅

著录项

  • 公开/公告号JPH08225929A

    专利类型

  • 公开/公告日1996-09-03

    原文格式PDF

  • 申请/专利权人 MATSUSHITA ELECTRIC IND CO LTD;

    申请/专利号JP19950034876

  • 发明设计人 NISHIKAWA YUKIO;YOSHIDA ZENICHI;

    申请日1995-02-23

  • 分类号C23C14/28;

  • 国家 JP

  • 入库时间 2022-08-22 04:01:13

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