Volatilization removal manner null of the quartz glass film due to optical

摘要

PURPOSE: To volatilize silica glass by irradiating light having specified wavelength like vacuum ultraviolet light to a silica glass film. ;CONSTITUTION: A silica glass film 2 with little amount of oxygen is formed on a substrate of silicon and while a part of the film being covered with a mask 3, undulator light 4 is irradiated to a silicon glass film 2 to volatilize the silica glass film 2 and form steps.;COPYRIGHT: (C)1995,JPO