首页> 中文期刊> 《核技术:英文版》 >HIGH ENERGY Xe^+ ENHANCED ADHESION OF Al AND Ag FILMS ON OPTICAL GLASS

HIGH ENERGY Xe^+ ENHANCED ADHESION OF Al AND Ag FILMS ON OPTICAL GLASS

         

摘要

The samples consisting of 100nm Al or Ag film on optical glass substrate were irradiated by a beam of Xe 5×1015 to 2×1016 cm-2 with energy 320 keV. The adhesion of films on substrates was tested by Xe+ irradiation. Optical character was measured by spectrophotometer. The ion mixing amount was measured by RBS. The results showed that after ion irradiating the adhesion of the film on the glass is enhanced. The adherent strength is greater than 10 kg/cm2. The thermal stability of the films is good. The irradiated film is more optically efficient, the surface is smooth and rendered more corrosion resistance. The mechanism of the film adhesion was discussed.

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