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SUBSTRATE FOR INK JET HEAD, INK JET HEAD, PRODUCTION OF INK JET DEVICE, SUBSTRATE FOR INK JET HEAD, INK JET HEAD AND INK JET DEVICE
SUBSTRATE FOR INK JET HEAD, INK JET HEAD, PRODUCTION OF INK JET DEVICE, SUBSTRATE FOR INK JET HEAD, INK JET HEAD AND INK JET DEVICE
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机译:喷墨头,喷墨头,生产喷墨设备的基质,喷墨头,喷墨头和喷墨设备的基质
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摘要
PURPOSE: To facilitate the control of film thickness while stabilize the emitting capacity by providing the etching part in the longitudinal direction of the heat generating part of a first insulating protective film to the inside equal to or more than 1/2 the sum of the thicknesses of first and second insulating protective films. ;CONSTITUTION: The etching part 111 in the longitudinal direction of the heat generating part of a first insulating protective film 108a is provided to the inside equal to or more than 1/2 the sum of the thickness of the first and second insulating protective films 108a, 108b from an end part. Whereupon, the effect of the difference in level of electrodes becomes large and the penetration of ink or electrical leak caused by the coating insufficiency of the protective films is formed. The film thickness of the protective films requires about 1m as is conventional in relation at least to the parts on the electrodes but, if a film thickness of at least 2000, pref., 3000 or more is ensured on the heat generating part, durability almost same to conventional one can be ensured. It is pref. to set the film thickness of a thin film part to 2000-7000.;COPYRIGHT: (C)1996,JPO
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