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Sequential Improvement from Cosolvents Ink Formulation to Vacuum Annealing for Ink-Jet Printed Quantum-Dot Light-Emitting Diodes

机译:共溶剂油墨配方的顺序改进对喷墨印刷量子点发光二极管进行真空退火

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摘要

Optimization of ink-jet printing conditions of quantum-dot (QD) ink by cosolvent process and improvement of quantum-dot light-emitting diodes (QLEDs) characteristics assisted by vacuum annealing were analyzed in this research. A cosolvent process of hexane and ortho-dichlorobenzene (oDCB) was optimized at the ratio of 1:2, and ink-jetting properties were analyzed using the Ohnesorge number based on the parameters of viscosity and surface tension. However, we found that these cosolvents systems cause an increase in the boiling point and a decrease in the vapor pressure, which influence the annealing characteristics of the QD emission layer (EML). Therefore, we investigated QLEDs’ performance depending on the annealing condition for ink-jet printed QD EML prepared using cosolvents systems of hexane and oDCB. We enhanced the quality of QD EML and device performance of QLEDs by a vacuum annealing process, which was used to prevent exposure to moisture and oxygen and to promote effective evaporation of solvent in QD EML. As a result, the characteristics of QLEDs formed using ink-jet printed QD EML annealed under vacuum environment increased luminescence (L), current efficiency (CE), external quantum efficiency (EQE), and lifetime (LT50) by 30.51%, 33.7%, 21.70%, and 181.97%, respectively, compared to QLEDs annealed under air environment.
机译:本研究分析了通过真空退火辅助辅助的量子点(QD)墨水喷墨印刷条件的墨水喷射印刷条件和量子点发光二极管(QLEDS)特性。以1:2的比例优化己烷和邻二氯苯(ODCB)的彩色溶剂方法,并根据粘度和表面张力的参数使用Ohnesorge号码分析喷墨性能。然而,我们发现这些脱水剂系统导致沸点的增加和蒸汽压力的降低,这影响了QD发光层(EML)的退火特性。因此,我们根据使用己烷和ODCB制备的喷墨印刷QD QD EML的退火条件来调查QLEDS的性能。我们通过真空退火过程提高了QD EML和器件性能的质量,用于防止水分和氧气暴露,促进QD EML中的溶剂的有效蒸发。结果,在真空环境下使用喷墨印刷的QD QD EML形成的QLED的特性增加了发光(L),电流效率(CE),外量子效率(EQE),寿命(LT50)以30.51%,33.7%分别为21.70%和181.97%,与空气环境下的QLED相比。

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