PATTERN FOR DRAWING ELECTRON BEAM, AND PROXIMITY EFFECT EVALUATION METHOD USING IT, AND ELECTRON BEAM DRAWING METHOD

摘要

PURPOSE: To improve the accuracy of proximity effect by providing a drawing pattern for detecting that the accumulated energy by the electron beam at the position of arrangement has reached a certain value, having such a size as not to affect the drawing area density and being arranged approximately at the center of a pattern. ;CONSTITUTION: An electron beam drawing pattern is composed of a pattern 1, which decides drawing area density, and a pattern 2 for detection, which does not affect the drawing area density but detects that the accumulated energy of an electron beam at the point has reached a certain value from the pattern after development. The area pattern 1 is a uniform pattern where the lines of drawing parts L in width are arranged intervals S apart. Accordingly, defining that the drawing area density is A, A=L/(L+S). For the amount of irradiation given to the area pattern 1, the accumulated energy at the center of the detection pattern is sought by the specified formula. Hereby, the drawing pattern can be selected larger enough than the range of rear scattering, and reflection coefficient can be sought independent of other proximity effect pattern.;COPYRIGHT: (C)1996,JPO