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ELECTRON BEAM DRAWING METHOD, METHOD FOR MANUFACTURING MASTER PATTERN, MASTER PATTERN, METHOD FOR MANUFACTURING MOLD, MOLD, OPTICAL DEVICE AND ELECTRON BEAM DRAWING APPARATUS
ELECTRON BEAM DRAWING METHOD, METHOD FOR MANUFACTURING MASTER PATTERN, MASTER PATTERN, METHOD FOR MANUFACTURING MOLD, MOLD, OPTICAL DEVICE AND ELECTRON BEAM DRAWING APPARATUS
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机译:电子束绘制方法,制造主图案的方法,主图案,制造模具,模具,光学器件和电子束绘制装置的方法
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摘要
PROBLEM TO BE SOLVED: To provide an electron beam drawing method by which an image is drawn in a shorter time and the drawing feature can be uniformly maintained without being influenced by the scanning position of the electron beam in the drawing region.;SOLUTION: Frequency signals having controlled amplitudes according to the scanning position (position of a superposition quantity division field) of the electron beam in a specified drawing region (drawing field) are superposed on the input signal to a deflector which deflects the electron beam so as to oscillate an electron beam B in a sub scanning direction (Y direction in the figure) in the drawn plane (surface of a resist layer L) of a substrate 2. Thereby, the electron beam B is made to scan in the main scanning direction (X direction in the figure) while meandering, and the degree of meandering is controlled to a value according to the position of the superposition quantity division field in the field.;COPYRIGHT: (C)2005,JPO&NCIPI
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机译:解决的问题:提供一种电子束绘制方法,通过该方法可以在更短的时间内绘制图像,并且可以均匀地保持绘制特征,而不受绘制区域中电子束的扫描位置的影响。根据在指定绘制区域(绘制场)中电子束的扫描位置(叠加量分割场的位置)而具有受控幅度的信号被叠加到偏转器上,该偏转器的输入信号使电子束偏转,从而使电子束B在基板2的绘制平面(抗蚀剂层L的表面)中在副扫描方向(图中的Y方向)上。从而,使电子束B在主扫描方向(X方向)上扫描。图中)弯曲时,根据叠加量分割字段在该字段中的位置将弯曲程度控制为一个值。版权所有:(C)2005,JPO&NCI PI
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