ETCHANTS FOR USE IN MICROMACHINING OF CMOS MICROACCELEROMETERS AND MICROELECTROMECHANICAL DEVICES AND METHOD OF MAKING THE SAME

摘要

What is described in the present specification are accelerometers using tiny proff masses (30) and piezoresistive force detection. The devices may include deformable hinges (40a-c) to allow the fabrication of three dimensional structures. A new system has been developed which etches silicon highly selectively at moderate temperature and without hydrodynamic forces potentially damaging to small structures and features. The system is based on the use of the gas phase etchant xenon difluouride, which is an unremarkable white solid at standard temperature and pressure.