Use: For plasma processing, it is generally used for vacuum surface treatment by beam-plasma discharge and for synthesis of inorganic films.;The subject of the present invention: the transfer piece-positioning device containing the used fragments and the solid inorganic material is placed inside the use chamber and later vacuumed, and the used gas is injected into the chamber. And, in the used piece surface treatment area, the vapor spray is formed as a result of the solid inorganic material deposition by the normal electron beam. At least one separate normal electron beam is formed in the interior of the chamber and is aimed at the used fragment surface treatment area. A separate electron beam axis traverses the axis of the vapor spray. Equipment is introduced for a separate material that is introduced into a separate electron beam and deposited. The chemically active particles as a mixture of the solid material vapor and the working gas are then directed to the surface of the working piece. A separate electron beam in the form of a ribbon is preferred.
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