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Hydrogen passivated heteroepitaxial III-V photovoltaic devices grown on lattice-mismatched substrates, and process

机译:在晶格不匹配的衬底上生长的氢钝化异质外延III-V光伏器件及其工艺

摘要

A hydrogen passivated photovoltaic device such as a solar cell comprises a lattice mismatched substrate such as Ge or Si, and a hydrogen passivated heteroepitaxial layer such as InP grown on the substrate. The hydrogen passivated heteroepitaxial III-V photovoltaic device is produced by exposing a sample of a heteroepitaxial III-V material grown on a lattice-mismatched substrate to reactive hydrogen species at elevated temperatures. Reactive hydrogen forms bonds with dangling bonds along dislocations defined in the sample. The electrical activity in the dislocations is passivated as a result of the hydrogenation process.
机译:氢钝化光伏器件(例如太阳能电池)包括晶格失配的衬底(例如Ge或Si)和氢钝化异质外延层(例如在衬底上生长的InP)。通过使在晶格不匹配的衬底上生长的异质外延III-V材料的样品在升高的温度下暴露于活性氢,可以制得氢钝化的异质外延III-V光伏器件。活性氢沿着样品中定义的位错与悬挂键形成键。由于氢化过程,位错中的电活性被钝化。

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