Production manner of the device which through the mask, exposes the portion of the device directly and as for the remaining part through the aforementioned mask and the reflecting interface, exposing indirectly, forms pattern

摘要

(57) Abstract As for this invention, the computer which possesses the surface being the manner which produces the device where (1) is provided, the aforementioned surface part (7,8) emission perception formation (6) exists at least, this emission perception formation (6) part through the mask (12), exposing with emission, the device regards production manner. For example as for this manner, the computer (1) especially it is ideal in production of the device which is used the etched circuit substrate, for example joint the foil for IC, or as the adapter plate with IC and the etched circuit substrate. Manner of the format which it mentions is known, 3 dimensions whose conductive pattern is complete (3D) the upper part section and the bottom section of the etched circuit substrate of form (22,24) it is formed. Because of this object, emission perception formation (6) is formed on conductor layer by electric accumulation, through the upper part mask and the bottom mask, is exposed, is developed and is patterned. This known manner is a fault which uses several masks. In addition, process is complicated and is expensive. The manner due to this invention, the mask (12) through, exposes the portion of aforementioned emission perception formation directly, features that, the other part is exposed the aforementioned mask (12) and the surface which reflects aforementioned emission (13) through, indirectly. Because of this, it is possible to expose several parts of emission perception formation with 1 masks. 1 masks (12) and the reflecting interface (13) it becomes more simple, becomes cheap.