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OXIDE THIN FILM STRUCTURE, MANUFACTURE OF THIN FILM, AND PIEZOELECTRIC SENSOR-ACTUATOR

机译:氧化物薄膜结构,薄膜制造和压电传感器致动器

摘要

PROBLEM TO BE SOLVED: To enable an oxide thin film to be stably formed even on a thermolabile substrate by a method wherein a platinum layer is deposited on an organic material, an oxide thin film is formed thereon so as to be a structure easily applicable to a piezoelectric device or the like, and an ultraviolet laser is employed. SOLUTION: An ultraviolet laser ray irradiation mechanism of an excimer laser is jointly provided to an ion beam sputtering mechanism, and pulse laser rays of about 100mJ/cm2 and p.r.f 10Hz are made to irradiate a thin film on deposition. A piezoelectric PbTiO3 thin film 6 of 3μm in thickness is formed as a piezoelectric oxide thin film on a polyimide film 8 which is about 50μm in thickness and where a platinum layer 9 of 0.1μm in thickness is provided. The thin film 6 is formed in an atmosphere of room temperatures as irradiated with ultraviolet rays by an excimer laser where XeCl gas is used while it is deposited. The excimer laser irradiates ultraviolet rays of wavelength 308nm and p.r.f 10Hz.
机译:解决的问题:为了通过在有机材料上沉积铂层的方法,即使在热不稳定的基板上也能够稳定地形成氧化物薄膜,在其上形成氧化物薄膜,以使其易于应用。压电装置等,使用紫外线激光。解决方案:准分子激光器的紫外线激光辐照机构与离子束溅射机构共同提供,并且使约100mJ / cm 2和p.r.f 10Hz的脉冲激光束辐照沉积时的薄膜。在厚度约50μm的聚酰亚胺膜8上形成厚度为3μm的压电PbTiO 3薄膜6作为压电氧化物薄膜,并设置厚度为0.1μm的铂层9。薄膜6是在受激准分子激光的紫外线照射下在室温的气氛中形成的,其中在沉积XeCl气体的同时使用XeCl气体。准分子激光器照射波长为308nm和p.r.f 10Hz的紫外线。

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