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Circular test structure for the determination of piezoelectric constants of ScxAl1−xN thin films applying Laser Doppler Vibrometry and FEM simulations

机译:使用激光多普勒振动法和有限元模拟确定ScxAl1-xN薄膜压电常数的圆形测试结构

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摘要

Piezoelectric scandium aluminium nitride (ScxAl1−xN) thin films offer a large potential for the application in micro electromechanical systems, as advantageous properties of pure AlN thin films are maintained, but combined with an increased piezoelectric actuation and sensing potential. ScxAl1−xN thin films with x = 27% have been prepared by DC reactive magnetron sputtering to find optimized deposition parameters to maximize the piezoelectric constants d33 and d31. For the accurate and simultaneous measurement of these constants Laser Doppler Vibrometry has been applied and compared to finite element (FEM) simulations. The electrode design has been optimized to rotational symmetric structures enabling a 180° phase shifted excitation, so that a straight-forward comparison of experimental displacement curves with those obtained from FEM is feasible.
机译:压电氮化铝铝(ScxAl1-xN)薄膜为微机电系统中的应用提供了巨大潜力,因为可以保持纯AlN薄膜的有利性能,但同时又增加了压电致动和感应电势。通过直流反应磁控溅射制备了x = 27%的ScxAl1-xN薄膜,以找到优化的沉积参数,以最大化压电常数d33和d31。为了准确而同时地测量这些常数,已应用激光多普勒振动计并将其与有限元(FEM)模拟进行比较。电极设计已针对旋转对称结构进行了优化,可实现180°相移激励,因此将实验位移曲线与从FEM获得的曲线进行直接比较是可行的。

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