MOLECULAR-BEAM SOURCE CRUCIBLE FOR MOLECULAR-BEAM EPITAXY

摘要

PURPOSE: To enable an increase in frequency of possible film formation and a reduction in process time due to no overflow of a melt from a crucible without reducing the amount of a charged raw material or decreasing the heating rate by finishing the inside surface of the crucible into a mirror surface and thereby suppressing the entry of the melt into the crucible. ;CONSTITUTION: This molecular-beam source crucible for molecular-beam epitaxy may be obtained by usually carrying out the mirror surface finish to the surface roughness of R_max≤2μm. The material of the crucible is preferably made of a pyrolytic boron nitride from the viewpoint of purity, heat resistance and strength. For example, the crucible is produced by reacting a mixed gas of ammonia with boron trichloride at 1900°C under ≤10Torr pressure, then depositing the resultant product in a mold made of graphite, taking out the deposited product from the mold and removing the graphite sticking to the inner surface by air oxidation. The mirror surface finish may be performed by polishing treatment with abrasive grains. The crucible thus produced can be used as a molecular beam source crucible for the molecular-beam epitaxy by attaching a heater, a reflector and a thermocouple thereto.;COPYRIGHT: (C)1997,JPO