DEVELOPMENT MONITORING APPARATUS AND DEVELOPMENT MONITORING METHOD USING IT

摘要

PROBLEM TO BE SOLVED: To facilitate the reworking by monitoring a developed part and not developed part. ;SOLUTION: A monitoring apparatus comprises a light source 7 to output an incident light 1 to a wafer having a photoresist film with a developing liq. 3 applied thereto, a light sensor 11 to detect light 9 reflected from the wafer 1, a filter 13 to pass the reflected light having desired wavelength only, a photoelectric element 17 for converting the reflected light 9 passed through the filter 13 into an electric signal, and an output unit to output the electric signal. The intensity change of this signal is measured in time to determine whether the photoresit film is developed or not. According to this, a quick rework is applied to the exposed wafer and not exposed wafer to thereby avoid the increased cost of a semiconductor device and lower yield.;COPYRIGHT: (C)1997,JPO