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VACUUM PUMPING EQUIPMENT, SEMICONDUCTOR MANUFACTURING EQUIPMENT, AND VACUUM PROCESSING METHOD

机译:真空泵设备,半导体制造设备和真空处理方法

摘要

PURPOSE: To provide a vacuum pumping equipment, a semiconductor manufacturing equipment, and a method for vacuum processing, by which high-performance semiconductor devices can be manufactured stably and with a high yield. ;CONSTITUTION: A vacuum pumping equipment consists of a turbo-molecular pump 103 and an auxiliary pump 105 which is connected to the exhaust side of the turbo-molecular pump. An entranced 114 for supplying specified gas is installed between a turbo-molecular pump 103 and the auxiliary pump 105. Thus, a vacuum chamber 101 is evacuated while it is charged with the specified gas through the gas entrance 114.;COPYRIGHT: (C)1996,JPO
机译:目的:提供一种真空泵送设备,一种半导体制造设备以及一种用于真空处理的方法,由此可以稳定且高产量地制造高性能的半导体器件。组成:真空泵设备由涡轮分子泵103和辅助泵105组成,辅助泵105连接到涡轮分子泵的排气侧。在涡轮分子泵103和辅助泵105之间安装了用于供应指定气体的入口114。因此,真空室101被抽空,同时通过进气口114充满了指定气体。;版权:(C) 1996年

著录项

  • 公开/公告号JPH08321448A

    专利类型

  • 公开/公告日1996-12-03

    原文格式PDF

  • 申请/专利权人 OMI TADAHIRO;

    申请/专利号JP19950126271

  • 发明设计人 OMI TADAHIRO;

    申请日1995-05-25

  • 分类号H01L21/02;C23C14/00;

  • 国家 JP

  • 入库时间 2022-08-22 03:30:46

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