Technique for the in situ photolithography of thin layers of superconducting materials having a high critical temperature

摘要

A film of metal which has the property of increasing in volume if subjected to oxidisation conditions is deposited on a crystalline substrate with a geometry obtained by standard photolithography. A film of superconducting material with a high transition temperature is deposited on the crystalline substrate treated with acid solution. The superconducting phase is prepared by simultaneous high temperature oxidation of the metal and the superconducting material having a high transition temperature. IMAGE