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Process for preparing a shield for reducing particles within a chamber physical vapor deposition.
Process for preparing a shield for reducing particles within a chamber physical vapor deposition.
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机译:制备用于减少腔室内物理气相沉积中的颗粒的屏蔽物的方法。
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摘要
IN A METHOD FOR PREPARING A DISPLAY (17) and / or clamping ring (16) prior to use in a process of vapor deposition physical DISPLAY (17) and / or clamping ring (16) is injected FIRST dross USING ABRASIVE DUST, then treated in a chamber ultrasonic cleaning to remove particles sputtered lOOSE AND AFTER AN ACID OR TREATY WITH A PLASMA. Sizzle OR TREATMENT OF PLASMA SERVES RELEASED POLLUTION CAN BE A BARRIER FOR DISSEMINATION AND PREVENTING DEPOSITS FROM THE LINK DISPLAY (17) and also it serves to roughen the surface of the screen (17) and / or The clamping ring (16) to reduce gaps interface and improve adhesion of sputtered MATTER ON SCREEN (17) and / or clamping ring (16). PROCESS OF THE INVENTION results in an improved cleaning DISPLAY (17) and / or the clamping ring (16) and an improved adhesion MATERIAL sizzled ABOUT THESE, WITH WHAT INCREASES THE TIME BEFORE THE SCREEN / RING TIGHTENING SHOULD BE CLEANED AND REDUCES THE TIME OF THE CHAMBER OF PHYSICAL VAPOR dEPOSITION (14).
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