Spun-on glass layer as a dry etch-mask, for fabricating a metallic mask by means of a bi-level process

摘要

A metallic mask is fabricated by using a patterned spun-on glass layer located on an initially uniformly thick metallic layer. In turn, the metallic layer is located on a transparent substrate such as quartz. Patterning of the spun-on glass layer is performed by means of an anistropic dry-etching step, using (as a dry-etch protective layer) an overlying patterned resist that has been patterned by means of a direct-writing electron beam followed by wet development. The patterned spun-on glass layer is used as a dry-etch protective layer during a subsequent anisotropic dry-etch patterning of the metallic layer. After the metallic layer thus has been patterned, the spun-on glass layer can be removed by means of a dilute aqueous solution of hydrofluoric acid.