首页> 外国专利> Apparatus and methods employing phase control and analysis of evanescent illumination for imaging and metrology of subwavelength lateral surface topography

Apparatus and methods employing phase control and analysis of evanescent illumination for imaging and metrology of subwavelength lateral surface topography

机译:利用相控和and逝光分析进行亚波长侧面形貌成像和计量的设备和方法

摘要

Imaging and metrology devices employ controlled phase shifting and analysis of evanescent light to provide enhanced ability to image and/or resolve substantially subwavelength lateral features on a surface illuminated by the evanescent light. The light waves comprising the evanescent electromagnetic field are inhomogeneous in that their planes of equal phase are substantially perpendicular to the direction of propagation and to their planes of constant amplitude. The planes of equal phase are therefore normal to the surface to which the evanescent field is adjacent and to a sample surface illuminated by this field as well. By controlling the phase of the source of illumination and analyzing the output from the surface, either by phase analysis or phase to amplitude decoding, subwavelength lateral surface topography resolution is enhanced without sacrificing vertical resolution. Methods and means for dynamic or static phase shifting of inhomogeneous waves comprising the evanescent field are disclosed, as well as other non- imaging applications.
机译:成像和计量装置采用对phase逝光的受控相移和分析,以提供增强的能力来成像和/或分辨由van逝光照射的表面上的基本上亚波长的横向特征。包含渐逝电磁场的光波是不均匀的,因为它们的同相平面基本上垂直于传播方向并垂直于它们的振幅恒定的平面。因此,相等相位的平面垂直于渐逝场相邻的表面,并且垂直于该场照亮的样品表面。通过控制照明源的相位并通过相位分析或相位至幅度解码来分析来自表面的输出,可以在不牺牲垂直分辨率的情况下提高亚波长侧面形貌的分辨率。公开了用于对包含the逝场的不均匀波进行动态或静态相移的方法和装置,以及其他非成像应用。

著录项

  • 公开/公告号US5666197A

    专利类型

  • 公开/公告日1997-09-09

    原文格式PDF

  • 申请/专利权人 POLAROID CORPORATION;

    申请/专利号US19960701173

  • 发明设计人 JOHN M. GUERRA;

    申请日1996-08-21

  • 分类号G01B9/02;

  • 国家 US

  • 入库时间 2022-08-22 03:09:27

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