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Method of fabricating a diffraction grating and a distributed feedback semiconductor laser incorporating the diffraction grating

机译:衍射光栅的制造方法以及具有该衍射光栅的分布式反馈半导体激光器

摘要

A quantum wire structure includes a substrate of a first semiconductor having a surface and a first band gap energy; a layer of a second semiconductor having a second band gap energy and including second semiconductor elements disposed on the surface of the substrate spaced apart in a pattern at an interval of no more than 100 nm, each second semiconductor element having a trapezoidal cross-section transverse to the surface of the substrate and including an upper surface generally parallel to the surface of the semiconductor substrate and sloped surfaces oriented so that a third semiconductor does not grow on the sloped surfaces; a layer of a third semiconductor having a third band gap energy smaller than the first and second band gap energies disposed on the upper surfaces of the second semiconductor elements and on the surface of the substrate between adjacent second semiconductor elements but not on the sloped surfaces; and a layer of a fourth semiconductor having a fourth band gap energy larger than the third band gap energy disposed on and burying the layers of the second and third semiconductors.
机译:一种量子线结构,包括具有表面和第一带隙能的第一半导体的衬底;第二半导体层,其具有第二带隙能并且包括以不大于100nm的间隔以图案间隔设置在基板表面上的第二半导体元件,每个第二半导体元件具有梯形横截面基板的表面上具有与半导体基板的表面大致平行的上表面和倾斜的取向的倾斜面,以使第三半导体不生长在倾斜的面上。第三半导体层,其第三带隙能量小于第一和第二带隙能量,该第三带隙能量设置在第二半导体元件的上表面上以及相邻的第二半导体元件之间的基板表面上,而不是在倾斜表面上;具有第四带隙能量大于第三带隙能量的第四半导体层设置在第二半导体层和第三半导体层上并掩埋。

著录项

  • 公开/公告号US5684823A

    专利类型

  • 公开/公告日1997-11-04

    原文格式PDF

  • 申请/专利权人 MITSUBISHI DENKI KABUSHIKI KAISHA;

    申请/专利号US19960611579

  • 发明设计人 KATSUHIKO GOTO;YUTAKA MIHASHI;

    申请日1996-03-07

  • 分类号H01S3/19;H01L21/20;

  • 国家 US

  • 入库时间 2022-08-22 03:09:06

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