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ELECTRODEPOSITION COATIMG COMPOSITION HAVING ELECTRODEPOSITION LATENCY AND METHOD FOR ELECTRODEPOSITION COATING
ELECTRODEPOSITION COATIMG COMPOSITION HAVING ELECTRODEPOSITION LATENCY AND METHOD FOR ELECTRODEPOSITION COATING
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机译:具有电沉积潜伏期的电沉积涂层组合物和电沉积涂层的方法
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摘要
PROBLEM TO BE SOLVED: To achieve an excellent bath stability in an electrodeposition process and improve the durability of a coating film, by combining an electrodeposition process in which a substrate to be coated is an anode or a cathode and a voltage is applied between the substrate and the other electrode to form a coating film on the substrate and a heating process in which the substrate having the coating film thereon is heated, and imparting electrodeposition latency to the curing reaction of the coating film. ;SOLUTION: In a curing reacting having electrodeposition latency, an activated chemical species which has been formed in a film by an electrode reaction accompanying the transfer of an electron when a coating film is formed by applying a voltage to a substrate to be coated in an electrodeposition process participates in a curing reaction. The activated chemical species is present in a coating film as a free radical for curing the film, a species capable of generating this radical with ease or the like, and accelerates a curing reaction and optionally another reaction. This state is maintained till a heating process is practiced. Electrode reactions occurring in an electrodeposition coating composition are shown in mechanisms of formulae I and II, wherein an electron is taken from or provided to a function group in a substance ('S' in the formulae) deposited on an electrode during an electrodepsition process.;COPYRIGHT: (C)1998,JPO
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