EVANESCENT WAVE DETECTING MICROPROBE AND MANUFACTURE THEREFOR, PROBE HAVING THIS MICROPROBE AND MANUFACTURE THEREFOR, EVANESCENT WAVE DETECTING DEVICE HAVING THIS MICROPROBE, NEAR FIELD OPTICAL SCANNING MICROSCOPE AND INFORMATION REPRODUCING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a microprobe by which the SN ratio and resolution can be improved and a uniform shape excellent in reproducibility can be obtained by forming a photoconductive material layer on a separative layer of a first substrate, and transferring this layer to a joining layer on a second substrate. ;SOLUTION: First of all, crystal axis anisotropic etching is performed on a first substrate 1 of monocrystal silicon, and after an inverse pyramid-shaped recessed part 3 is formed, a separative layer 4 is formed on an upper surface of the substrate 1. Next, a photoconductive film 5 of amorphous silicon is formed, and is etched, and a photoconductive material layer 7 is formed. Next, electrodes 10 and 11 are formed on a second base board 12 of Pyrex glass, and these are brought into contact with a surface of the substrate 1, and are heated, and are press-fitted. Then, since an alloy layer is formed and joined on an interface between the material layer 7 and the electrodes 10 and 11, the substrate 1 is torn off by the sensitive layer 4, and a pyramid-shaped microprobe 20 is formed. Therefore, the microprobe excellent in the SN ratio and resolution is obtained, and a system-simplified evanescent wave detecting device and a near field optical scanning microscope or the like can be constituted by using this.;COPYRIGHT: (C)1998,JPO