ELECTRON BEAM ALIGNER AND METHOD OF MANUFACTURING DEVICE USING THE ALIGNER

摘要

PROBLEM TO BE SOLVED: To improve the throughput by using an arcuate electron beam, means for correcting the aberration of the electron beam and means for scanning a wafer and mask. ;SOLUTION: A light 2 from an optical source or sec. optical source 1 enters an aperture 4 by an illuminating optical system 3. The aperture 4 cuts the light into an arcuate region and guides it to a mask 5 having light-transmitting and -opaque parts. The mask 5 is irradiated with the light having the arcuate illuminating region to project a pattern of the mask on a photoelectric conversion plane PE through a projection optical system PL. A photoelectric converter member composed of this conversion plane PE and light-transmitting member S radiates an electron beam according to the pattern image on the mask 5. This beam is accelerated by accelerating electrodes to form an image on a wafer 14 through a reduced electron-optical system where the beam aberration is corrected by an aberration correcting optical system 7.;COPYRIGHT: (C)1998,JPO