REACTIVE PHYSICAL VAPOR DEPOSITING DEVICE AND REACTIVE PHYSICAL VAPOR DEPOSITING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a method capable of executing reactive PVD treatment in the presence of nitrogen and to provide a device therefor. ;SOLUTION: This device is provided with a vacuum chamber 34, a substrate supporting part 20 arranged in the vacuum chamber 34, a target 22 made of metal selected from the groups of fire resistant metals and noble metals and arranged on the upper direction of the substrate supporting part 20, a gas suction port for introducing gaseous nitrogen into the vacuum chamber 34 and a nonevaporating type getter pump 25 provided as a primary pump means for the vacuum chamber 34 in the process of reactive physical vapor deposition of the metallic nitride in the surface of a substrate. The getter pump 25 is made of an alloy substantially composed of zirconium and iron, preferably, of 15 to 30wt.% iron and 70 to 85wt.% zirconium.;COPYRIGHT: (C)1998,JPO