首页> 外国专利> MEMORY REPAIR METHOD, AND ELECTRON BEAM MEMORY REPAIR DEVICE WHERE THE MEMORY REPAIR METHOD IS APPLICABLE, AND MEMORY REDUNDANT CIRCUIT

MEMORY REPAIR METHOD, AND ELECTRON BEAM MEMORY REPAIR DEVICE WHERE THE MEMORY REPAIR METHOD IS APPLICABLE, AND MEMORY REDUNDANT CIRCUIT

机译:内存修复方法以及适用于内存修复方法和内存冗余电路的电子束内存修复设备

摘要

PROBLEM TO BE SOLVED: To provide a memory repair method where the interval between fuses can be made about 2μm or under and besides which does not damage the layer under the fuses. ;SOLUTION: This device is equipped with a fuse within a semiconductor memory chip and a redundant cell capable of switching to a normal cell by the cut off of this fuse, and in case that there is a blank in the normal memory cells, it is switched to a redundant cell by cutting off the fuse corresponding to the normal memory cell. At this time, a pattern in a specified form is made by applying resist all over the surface of the chip, and exposing and developing the section of the fuse corresponding to the blank normal memory cell. The fuse is cut by etching, using this resist pattern 51 as a mask.;COPYRIGHT: (C)1997,JPO
机译:要解决的问题:提供一种内存修复方法,在这种方法中,保险丝之间的间隔可以做成大约2μm或以下,并且不会损坏保险丝下面的层。 ;解决方案:此设备在半导体存储芯片中装有熔丝,并且冗余单元能够通过切断该熔丝而切换到普通单元,如果普通存储单元中有空白,则为通过切断与正常存储单元对应的保险丝,将其切换到冗余单元。此时,通过在芯片的整个表面上施加抗蚀剂,并对对应于空白普通存储单元的熔丝的部分进行曝光和显影,来形成指定形式的图案。使用该抗蚀剂图案51作为掩模,通过蚀刻切割熔丝。版权所有:(C)1997,JPO

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