首页> 外国专利> Method for recovering copper from cupric chloride etching waste liquid

Method for recovering copper from cupric chloride etching waste liquid

机译:从氯化铜蚀刻废液中回收铜的方法

摘要

PURPOSE:To remove a halogen radical from copper halide solution containing free halogen and a complex of halogen and copper. CONSTITUTION:An anion-exchange membrane 2 is arranged inside a dialysis tank 1 so that the dialysis tank 1 may be divided into a copper halide solution tank 11 and a solvent tank 12 by it. Copper halide solution containing free halogen and a complex of halogen and copper is fed to the copper halide solution tank 11 and simultaneously to the solvent tank 12 is fed, for example, ion exchanged water. Since the free halogen existing in the copper halide solution is passed through the anion-exchange membrane 2 to transfer it to the ion exchanged water side, causing the free halogen on the copper solution side to be decreased, the halogen in the complex is eliminated as the free halogen in order to maintain the equilibrium and the eliminated halogen is similarly transferred to the ion exchanged water side afterwards. Therefore, the halogen radical existing as a free halogen or the complex is removed.
机译:目的:从含有游离卤素以及卤素和铜的络合物的卤化铜溶液中除去卤素自由基。组成:阴离子交换膜2布置在透析槽1的内部,这样透析槽1可以分为卤化铜溶液槽11和溶剂槽12。将包含游离卤素以及卤素和铜的络合物的卤化铜溶液供给至卤化铜溶液槽11,并且同时将例如离子交换水供给至溶剂槽12。由于存在于卤化铜溶液中的游离卤素穿过阴离子交换膜2而转移到离子交换水侧,从而导致铜溶液侧的游离卤素减少,因此络合物中的卤素被消除。为了保持平衡,游离卤素随后被类似地转移到离子交换水侧。因此,作为游离卤素或络合物存在的卤素自由基被除去。

著录项

  • 公开/公告号JP2779562B2

    专利类型

  • 公开/公告日1998-07-23

    原文格式PDF

  • 申请/专利权人 TSURUMI SOODA KK;

    申请/专利号JP19910359698

  • 发明设计人 INOKO MASANORI;TERADA SEI;KONDO MASAHIRO;

    申请日1991-12-27

  • 分类号C23F1/46;C22B15/00;

  • 国家 JP

  • 入库时间 2022-08-22 03:01:12

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号