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Non electrolytic nickeling manner null of spelter or spelter

机译:非电解镀镍方式,喷锡或喷锡无效

摘要

PURPOSE:To form an electroless Ni plating excellent in adhesion on a Zn material to be plated by treating the material with an aq. alkaline soln. contg. Ni and Cu ions to form a substituted film and then plating the material in an electroless Ni plating bath. CONSTITUTION:A material to be plated consisting of Zn or its alloy is treated with an aq. alkaline soln. contg. Ni and Cu ions to form a substituted film. NiSO4, etc., are used as the Ni ion source and CuSO4, etc., as the Cu ion source. Zu ion is incorporated, as required, into the substitution soln. using ZnSO4, etc., and further a complexing agent for the metal ion in the substitution soln. such as NH3, EDTA can be added. The substitution reaction is preferably carried out by dipping the material in the soln. at room temp. for about 1-10 min. The material coated with the substituted film is electroless-Ni-plated preferably in an alkaline medium. When the film thickness has to be increased, the material is further electroless-Ni-plated at a high rate in an acidic medium.
机译:用途:在要电镀的Zn材料上形成附着力极佳的化学镀镍,方法是用无水NaCl处理该材料。碱性溶液。续Ni和Cu离子形成取代的膜,然后在无电镀镍镀液中镀覆材料。组成:待镀锌或锌合金组成的材料用碳酸氢钠水溶液处理。碱性溶液。续镍和铜离子形成取代的膜。 NiSO 4等用作Ni离子源,而CuSO 4等用作Cu离子源。根据需要将Zu离子掺入取代溶液中。使用ZnSO4等,并在取代溶液中进一步加入金属离子的络合剂。例如NH3,EDTA均可加入。取代反应优选通过将材料浸入溶液中进行。在室温下大约1-10分钟。涂覆有替代膜的材料最好在碱性介质中进行化学镀镍处理。当必须增加膜厚度时,该材料在酸性介质中进一步以高速率化学镀镍。

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