首页> 外国专利> Method and device for electron beam irradiation of lif monocrystals in order to manufacture passive laser switches with f2 colour centres.

Method and device for electron beam irradiation of lif monocrystals in order to manufacture passive laser switches with f2 colour centres.

机译:用于制造lif单晶电子束的方法和装置,以制造具有f2色心的无源激光开关。

摘要

The invention refers to a method and device for electron beam irradiation of LiF monocrystals in order to manufacture passive laser switches with F2 colour centres, which ensures the uniform irradiation of LiF monocrystals at a 20...30 Mrad/h output of the irradiation dose. At the 1.064 μm wavelength, after irradiation doses of 70...80 Mrad, the absorption factors reach 0.4...0.45 cm-1. The crystals are prevented from overheating by cooling the air-tight sheath, into which the LiF monocrystals are introduced, with a thermostat-controlled water current at a temperature of 10...15 degrees C. The irradiation time is 2...3 hours.
机译:本发明涉及一种用于LiF单晶的电子束辐照的方法和装置,以制造具有F2色心的无源激光开关,其确保以20 ... 30 Mrad / h的辐照剂量输出均匀地辐照LiF单晶。 。在1.064μm波长处,在70 ... 80 Mrad的辐照剂量后,吸收系数达到0.4 ... 0.45 cm-1>。通过在10 ... 15摄氏度的温度下通过恒温器控制的水流冷却引入LiF单晶的气密套,可以防止晶体过热。辐照时间为2 ... 3小时。

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