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Quantitative analysis method of cations and anions in plating solution
Quantitative analysis method of cations and anions in plating solution
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机译:电镀液中阳离子和阴离子的定量分析方法
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摘要
The present invention relates to a method for quantitatively analyzing cations and anions in a plating solution, and it is an object of the present invention to provide a method for quantitatively analyzing cations and anions in a plating solution which can simultaneously analyze cations and anions, Method, which has its purpose.;The present invention relates to a method for producing a plating solution, which comprises diluting a plating solution containing a cation and an anion and then dropping the solution on a dripping filter; Drying the deposited plating solution by the vacuum drying method; Measuring a Kα line intensity of each ion to be analyzed by fixing an aluminum thin plate to the bottom of the filter paper, irradiating X-ray to the spot filter paper where the plating solution is dropped and dried as described above; Measuring the intensity of the K? Line for each concentration of each of the ions through the steps while varying the concentration of each of the ions; Preparing a calibration curve for each ion, which is a correlation between the concentration of each ion and the K alpha ray intensity, using the K alpha ray intensity values measured as described above; Measuring the K alpha ray intensity of the ion to be analyzed by the above step and substituting the K alpha line value into the calibration curve to determine the concentration of each ion, the quantitative determination of the cation and the anion in the plating solution The analytical method is the point.
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