Polysilazane coating liquid for forming interlayer dielectric coating film and method of forming silicon dioxide interlayer dielectric coating film using same

摘要

Storage stability, and the production of the excellent coating properties, a variety of electronic devices, and an object of the invention to provide a coating solution used for forming the interlayer insulating film of SiO2, solvent is preferably a main component of the coating liquid dialkyl ether, ¹ H The NMR spectrum is characterized in that the polysilazane compound is adjusted with a trimethylsilylating agent such as hexamethyldisilazane such that the area ratio of the SiH ₃ peak to the total area of the SiH ₁ and SiH ₂ peaks is 0.15 to 0.45. In addition, after applying this coating liquid to a board | substrate and drying the coating layer, an interlayer insulation film can be formed by baking a dried coating layer at 300-800 degreeC under humidified atmosphere. The coating liquid further contains a trialkylamine compound as an inhibitor for inhibiting the sublimation of low molecular weight components of the polysilazane compound, and the trialkylamine is maintained by maintaining the coating layer before drying at 25 to 100 ° C. for at least 1 minute. And the reaction of the polysilazane molecule is terminated.