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Complementary Metal Oxide Semiconductor Horn Voltage Input / Output Driver Circuit and High Reliable I / O Stacked Field Effect Transistor

机译:互补金属氧化物半导体喇叭电压输入/输出驱动器电路和高可靠的I / O堆叠场效应晶体管

摘要

SUMMARY OF THE INVENTION In accordance with the present invention, in I / O stacked field effect transistors (FETs), the impact on device reliability due to chip edge length variation (ACLV), gate ion channeling and potential is reduced or eliminated. A pair of stacked PFETs and a pair of stacked NFETs are connected to the I / O pad. PFETs and NFETs adjacent to I / O pads are each designed to have a longer channel length than PFETs and NFETs that are separate from the I / O pads. This has the effect that the PFET and NFET adjacent to the I / O pad are not affected by leakage.;Alternatively, a Schottky or P / N junction diode is connected between the node between the two PFETs and the gate of the PFET adjacent to the I / O pad and another Schottky or P / N junction diode is connected between the node between the two NFETs And the gate of the NFET adjacent to the I / O pad. These Schottky diodes operate to clamp the nodes between the PFET pair and the NFET pairs to a voltage close to the gate voltage, respectively. A similar clamping operation can be realized by using NFET instead of Schottky or P / N junction diode for PFET pair and using PFET instead of Schottky or P / N junction diode for NFET pair.
机译:发明内容根据本发明,在I / O堆叠的场效应晶体管(FET)中,减小或消除了由于芯片边缘长度变化(ACLV),栅离子沟道和电势对器件可靠性的影响。一对堆叠的PFET和一对堆叠的NFET连接到I / O焊盘。与I / O焊盘相邻的PFET和NFET各自被设计为具有比与I / O焊盘分开的PFET和NFET更长的沟道长度。这样做的结果是,与I / O焊盘相邻的PFET和NFET不受泄漏的影响;或者,在两个PFET之间的节点和与P / N相邻的PFET的栅极之间连接了一个肖特基或P / N结二极管I / O焊盘和另一个肖特基或P / N结二极管连接在两个NFET之间的节点和与I / O焊盘相邻的NFET的栅极之间。这些肖特基二极管用于将PFET对和NFET对之间的节点分别钳位到接近栅极电压的电压。对于PFET对,使用NFET代替肖特基或P / N结二极管,对NFET对使用PFET代替肖特基或P / N结二极管,可以实现类似的钳位操作。

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