Fabrication of VLSI Capacitors and High Quality Factor VLSI Inductors Using Metal Charge Via Plugs

摘要

A method of manufacturing an inductor and a capacitor consisting of charging a via of a dielectric with a metal plug disposed between two metal layers is disclosed. The plug consists of tungsten, aluminum or copper and extends the length of the metal layer. The plug connects two metal layers to form an inductor. Two plugs may be formed to connect two metal layers to form a parallel plate capacitor.