首页> 外国专利> Wet buffing method, deposition plating method, workpiece buffing method, workpiece buffering device, barrel buffing device, surface treatment method of workpiece, workpiece supporting unit and buffing medium for barrel buffing device

Wet buffing method, deposition plating method, workpiece buffing method, workpiece buffering device, barrel buffing device, surface treatment method of workpiece, workpiece supporting unit and buffing medium for barrel buffing device

机译:湿式抛光法,沉积镀敷法,工件抛光法,工件缓冲装置,桶抛光装置,工件的表面处理方法,工件支撑单元和用于桶抛光装置的抛光介质

摘要

The wet buffing process is carried out such that the final buffing step is carried out in an alkaline buffing liquid and the remaining buffing step is carried out in another acidic buffing liquid. The workpiece buffing device is characterized in that the workpiece buffing device is arranged such that the connection disassembly member is disposed at the front end of the shaft relative to the workpiece, the outer side of the buffing wheel contacts the disconnection preventing member and the tightening nut engages spontaneously with the buffing wheel, Thereby firmly securing it to the shaft. Further, the surface treatment execution method is performed so that the workpiece is subjected to barrel buffing treatment before or after the surface treatment, and then each surface treatment is performed. Further, the workpiece supporting apparatus has a buffer medium receiving container and a workpiece supporting arm accommodating the buffing medium. Furthermore, the buffing medium usable in the buffing device is composed of a small block of a soft material or a grain of soft material.
机译:进行湿式抛光工艺,使得最终抛光步骤在碱性抛光液中进行,其余的抛光步骤在另一种酸性抛光液中进行。工件抛光装置的特征在于,工件抛光装置被布置成使得连接拆卸构件相对于工件设置在轴的前端,抛光轮的外侧接触防脱离构件和紧固螺母。自发地与抛光轮啮合,从而将其牢固地固定到轴上。此外,执行表面处理执行方法,使得在表面处理之前或之后对工件进行滚筒抛光处理,然后执行每个表面处理。此外,工件支撑装置具有缓冲介质容纳容器和容纳抛光介质的工件支撑臂。此外,可用于抛光装置的抛光介质由一小块软材料或一粒软材料组成。

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