Multifocal alignment device considering the density of the pattern

摘要

1. Technical Field of the devised set forth in; Focus alignment equipment of the semiconductor exposure equipment; 2. The technical problem to be solved in devising; The subject innovation is, By and the correction in consideration of the signal detected in the dense pattern portion to focus on a sensor that can detect the density of the pattern to prevent defective pattern formation by focusing or alignment errors, and hyangsi the stabilization, and productivity of the process to provide a multi-focus alignment device considering the density of the pattern that it is an object.; 3. Resolution of the subject matter of devising; Is the subject innovation are provided in the lower end of the projection lens to reduce the light passing through a pattern formed on a reticle Pew jewel mark for aligning a position of the reticle and the wafer stage; A halogen lamp mounted on a side of the projection lens for irradiating light thereto; And provides a multi-focus alignment device considering the density of the pattern, it characterized in that it comprises a sensor which is attached to the other side of the projection lens receiving the reflected light from the Fourier dual mark detecting the density of the corresponding chip pattern.; 4. An important use of the invention,; Used to focus the alignment of a semiconductor lithographic process equipment.