method of producing metrological structures particularly suitable for the determination of the precision in devices, the distance to measure the processed substrates

摘要

Process for producing metrological structures particularly useful for analyzing the accuracy of instruments for measuring alignment on processed substrates. The process produces metrological structures which have measurement profiles defined on substrate regions and on industrially-processed regions on a single wafer. The measurement profiles define statistical distributions which can be detected by measurement machines in order to analyze the measurement accuracy of the machines themselves. IMAGE