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A process for preparing metrological structures particularly suitable for the determination of the precision in devices which measure the distance on treated substrates

机译:一种制备计量结构的方法,该方法特别适用于确定测量已处理基材上距离的设备的精度

摘要

process for the realization of metrological structures particularly for the analysis of the accuracy of instruments for measuring alignment on substrates processed the peculiarity of which.ste in metrological structures having profiles of measure carried out on areas of substrate and on areas processed industrially on a single wafer.the profiles of size distributions are detectable with statistical machine to measure for the analysis of accuracy of measurement of the machines themselves.
机译:用于实现计量结构的方法,特别是用于分析用于测量基板上对准的仪器的精度的方法,其特点是:在计量结构中的计量结构在基板区域和在单个晶片上进行工业处理的区域上具有测量轮廓尺寸分布的轮廓可通过统计机器进行检测,以测量机器本身的测量精度。

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