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Increasing stabilized performance of amorphous silicon based devices produced by highly hydrogen diluted lower temparature plasma deposition

机译:通过高度氢稀释的低温等离子体沉积生产的非晶硅基器件的稳定性能提高

摘要

A solar cell has a region comprising amorphous Si and has an open circuit voltage of at least 0.9 volts and a fill factor of at least 0.7. The cell has a rapidly light-saturable amorphous Si region to prevent photo-degradation in less than 1500 hours. The cell may be made by a plasma deposition process at less than 250{C and up to 50 Torr, preferably by glow discharge of a silane with or without methane in the presence of a high concentration of hydrogen gas e.g. up to 1000:1. It is preferably a pin device which may have three junctions including layers of Si, SiC and SiGe with a plurality of intrinsic layers.
机译:太阳能电池具有包含非晶硅的区域,并且具有至少0.9伏的开路电压和至少0.7的填充系数。该电池具有快速光饱和的非晶硅区域,可防止在不到1500小时的时间内发生光降解。可以通过在小于250℃且至多50Torr下的等离子体沉积工艺来制造电池,优选通过在存在或不存在甲烷的情况下在高浓度氢气例如氢气存在下对硅烷进行辉光放电来制备。高达1000:1。优选地,该引脚器件可以具有三个结,包括具有多个本征层的Si,SiC和SiGe层。

著录项

  • 公开/公告号GB9801535D0

    专利类型

  • 公开/公告日1998-03-25

    原文格式PDF

  • 申请/专利权人 AMOCO/ENRON SOLAR;

    申请/专利号GB19980001535

  • 发明设计人

    申请日1995-03-09

  • 分类号H01L31/0376;

  • 国家 GB

  • 入库时间 2022-08-22 02:41:03

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