首页> 外国专利> Method for correcting spherical aberration of the electron beam in a scanning electron beam computed tomography system

Method for correcting spherical aberration of the electron beam in a scanning electron beam computed tomography system

机译:在扫描电子束计算机断层摄影系统中校正电子束的球面像差的方法

摘要

In a scanning electron beam CT system, spherical aberration of the electron self-forces produces a deleterious halo around the final electron beam spot, causing loss of definition in the image rendered by the system. The spherical aberration is caused by non-uniform electron beam current density, and by non-uniform distribution of positive ions in the transition region of the beam-optical systems. The non-uniform electron beam current density depends upon the axial position of the electron gun cathode, while the transition region ion distribution depends upon the potential coupled to the washer-shaped positive ion electrode ("PIE") used to segregate the upstream and downstream portions of the electron beam. In the present invention, the beam spot halo is minimized (if not eliminated), and image definition is maximized by selecting the electron gun cathode axial position and the PIE potential such that their contributions to spherical aberrations at the final beam spot cancel.
机译:在扫描电子束CT系统中,电子自力的球面像差会在最终的电子束光斑周围产生有害的光晕,从而导致该系统渲染的图像失去清晰度。球面像差是由于电子束电流密度不均匀,以及电子束在光学系统的过渡区域中阳离子分布不均匀而引起的。电子束电流密度的不均匀取决于电子枪阴极的轴向位置,而过渡区离子的分布取决于耦合至用于分隔上游和下游的垫圈形正离子电极(“ PIE”)的电势电子束的一部分。在本发明中,通过选择电子枪阴极的轴向位置和PIE电势,使束斑晕最小化(如果没有消除),并且使图像清晰度最大化,从而消除了它们对最终束斑处球差的贡献。

著录项

  • 公开/公告号US5719914A

    专利类型

  • 公开/公告日1998-02-17

    原文格式PDF

  • 申请/专利权人 IMATRON INC.;

    申请/专利号US19950557969

  • 发明设计人 GLENN R. JAMES;KHEM GAREWAL;ROY E. RAND;

    申请日1995-11-13

  • 分类号G01N23/00;

  • 国家 US

  • 入库时间 2022-08-22 02:40:13

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