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Exposure method using reference marks on both the mask and the substrate and capable of providing high alignment precision even after multiple exposures
Exposure method using reference marks on both the mask and the substrate and capable of providing high alignment precision even after multiple exposures
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机译:使用掩模和基板上的参考标记的曝光方法,即使在多次曝光后也能够提供高对准精度
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摘要
Alignment between a mask and a photosensitive substrate is performed using a first reference mark formed on the mask and a second reference mark formed on the photosensitive substrate. After that, the mask and the photosensitive substrate are relatively moved, so that an image of one of a light-shielding pattern and a light-transmitting pattern formed at a position different from the first reference mark on the mask is formed on the second reference mark on the photosensitive substrate. Then, a circuit pattern formed on the mask is transferred onto the photosensitive substrate, and a partial region including the second reference mark is exposed with the image of one of the light- shielding pattern and the light-transmitting pattern.
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