PARTICLE BEW INSPECTION SYSTEM AND INSPECTION METHOD, AND PARTICLE BEW-APPLYED SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide a particle beam inspection system of higher throughput. ;SOLUTION: An electron beam measuring system calculates a feature frequency corresponding to a focus shift from the Fourier spectrum of a sample image with its focus-shift computing element 60, makes a focus-shift beam- distribution function corresponding to the frequency with its beam distribution generator 61, removes the components of the beam-distribution function from the sample image stored in a unidimensional image memory 71 with its deconvolution computing element 51, anti thus measures the resultant sample image with its measurement computing element 72. This system dispenses with a focusing time by particle beam scanning to thereby shorten the inspection time for the measurements and appearance defects of semiconductor devices or the like.;COPYRIGHT: (C)1999,JPO