首页> 外国专利> METHOD FOR MANUFACTURING SAMPLE FOR MEASURING CRYSTAL LATTICE DISTORTING AND METHOD FOR MEASURING CRYSTAL LATTICE DISTORTION

METHOD FOR MANUFACTURING SAMPLE FOR MEASURING CRYSTAL LATTICE DISTORTING AND METHOD FOR MEASURING CRYSTAL LATTICE DISTORTION

机译:制造用于测量晶格畸变的样品的方法和用于测量晶格畸变的方法

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a sample for measuring crystal lattice distortion for avoiding the separation of HOLZ(higher order layer zone) line and a method for measuring a crystal distortion lattice with improved accuracy. ;SOLUTION: First, a sample piece 1 including a measuring part 2 is cut from a wafer. Then, film 8 is deposited on the surface of the sample piece 1 so that the measuring part 2 is covered. Then, three dummy pieces 4 are applied with the sample piece 1 is in the middle and a sample block 3 is manufactured. The sample block 3 is cut along two cutting surfaces 5a and 5b that are vertical to the sample piece 1 with the measuring part 2 in-between, thus manufacturing a sample cutting piece. Then, a desired polishing finish is performed to both surfaces of the above sample cut piece for exposing the measuring part 2, thus obtaining a section sample 6 for TEM(transmission type electron microscope) where the measuring part 2 is thinned. Convergence electron rays 7 are applied to the section sample 6 thus manufactured using the TEM to measure a HOLZ pattern.;COPYRIGHT: (C)1999,JPO
机译:解决的问题:提供一种用于制造用于避免HOLZ(高阶层区域)线的分离的用于测量晶格畸变的样品的方法以及用于以更高的精度测量晶体畸变晶格的方法。 ;解决方案:首先,从晶片上切下包括测量部分2的样品1。然后,将膜8沉积在样品片1的表面上,从而覆盖测量部分2。然后,在中间放置有样品片1的状态下施加三个假件4,并制造样品块3。沿着垂直于样品片1的两个切割表面5a和5b切割样品块3,将测量部件2置于其间,从而制造样品切割片。然后,对上述样品切割片的两个表面进行所需的抛光以暴露测量部分2,从而获得用于TEM(透射型电子显微镜)的截面样品6,其中测量部分2变薄。使用TEM将如此会聚的电子射线7施加到由此制成的截面样品6上,以测量HOLZ图案。COPYRIGHT:(C)1999,JPO

著录项

  • 公开/公告号JPH11101724A

    专利类型

  • 公开/公告日1999-04-13

    原文格式PDF

  • 申请/专利权人 NEC CORP;

    申请/专利号JP19970262383

  • 发明设计人 SAKAI TETSUYA;

    申请日1997-09-26

  • 分类号G01N1/28;G01N1/32;H01J37/295;

  • 国家 JP

  • 入库时间 2022-08-22 02:35:19

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