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METHOD FOR ADJUSTING IRRADIATION POSITION WITH BEAM, FOREIGN MATTER DETECTING APPARATUS USING LASER BEAM, SCANNING ELECTRON MICROSCOPE AND COMPOSITION ANALYZING APPARATUS
METHOD FOR ADJUSTING IRRADIATION POSITION WITH BEAM, FOREIGN MATTER DETECTING APPARATUS USING LASER BEAM, SCANNING ELECTRON MICROSCOPE AND COMPOSITION ANALYZING APPARATUS
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机译:用光束调整照射位置的方法,使用激光束的外来物质检测装置,扫描电子显微镜和成分分析装置
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摘要
PROBLEM TO BE SOLVED: To facilitate adjustment of an irradiation position with beams to a stage. ;SOLUTION: A photodetector 51 for detecting laser beams is set at an XY stage 21 driven in XY directions. A laser light source 32 for making a laser beam irradiate the XY stage 21 and a different photodetector 33 from the photodetector 51 on the XY stage 21 are arranged above the XY stage 21. While a position where the photodetector 51 on the XY stage 21 detects the laser beam from the laser light source 32 is set as a reference position, the XY stage 21 and laser light source 32 are moved relatively. The photodetector 33 detects a scattering light from a wafer when the laser beam irradiates the wafer placed on the XY stage 21, thereby detecting a foreign matter on the wafer.;COPYRIGHT: (C)1999,JPO
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