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PHOTOMASK DEFECT ANALYSIS APPARATUS AND DEFECT ANALYSIS METHOD AS WELL AS RECORD MEDIUM RECORDED WITH PHOTOMASK DEFECT ANALYSIS PROGRAM
PHOTOMASK DEFECT ANALYSIS APPARATUS AND DEFECT ANALYSIS METHOD AS WELL AS RECORD MEDIUM RECORDED WITH PHOTOMASK DEFECT ANALYSIS PROGRAM
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机译:光掩模缺陷分析装置和缺陷分析方法以及用光掩模缺陷分析程序记录的记录介质
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摘要
PROBLEM TO BE SOLVED: To provide a photomask pattern defect analysis apparatus and method capable of analyzing the cause for the occurrence of abnormality, etc., in a production process by accumulating the detailed information of defects as well as a recording medium recorded with a photomask defect analysis program. ;SOLUTION: The image data of the defective part detected by a defect observation inspection section 1 is converted to bit map image data in an image input section 2 and thereafter, the defective part is recognized in an image processing section 3. The area, shape, size, kind, etc., of the recognized defective part are decided in a defect deciding section 4. The result of the decision is accumulated as the defect information in a defect information data base 5. The characteristics, cause for the occurrence, etc., of the detected defective part are analyzed in a data analysis section 6 in accordance with the defect information obtd. by the defect deciding section 4 and the defect information accumulated in the defect information data base 5. The result of the analysis is outputted from a data output section 7.;COPYRIGHT: (C)1999,JPO
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