FILM PATTERNING METHOD, MANUFACTURE OF SEMICONDUCTOR ELEMENT, THIN-FILM SOLAR CELL, AND MANUFACTURE OF THE SOLAR CELL

摘要

PROBLEM TO BE SOLVED: To conduct patterning films simply. ;SOLUTION: In a layered product 3 with a second film 2 laminated on a first film 1 a nozzle 4 is jetted towards the regions to be removed of the second film 2 a liquid 5 with a pressure higher than the atmospheric pressure, some portions of the second film 2 are removed by the pressure of the liquid 5 to pattern the second film 2. In the used liquid 5, the etching-speed ratio of the second film 2 to the first film 1 is made not lower than 10:1, and its pH is held within the range of 2.5-6 or 8.0-11.5, and its jetted pressure is held within the range of 100-500 kg/cm². Such a patterning method is utilized in the patterning processing of the translucent conductive film, photoelectric conversion film, and rear-surface electrode film of an integrated thin-film solar battery.;COPYRIGHT: (C)1999,JPO